LIDIZ 700
RF IBS for sputtering and assistance, Automatic Optical Monitoring, Multiple choice of substrate holder (single disk, planetary, High speed), Load-lock
LIDIZ 700
The I-Photonics IBS coater LIDIZ 700 is designed to produce cutting-edge optical interference coatings as band pass filters, multispectral filters, beam splitters and ultra low-loss laser mirrors.
With its configurable options on substrate holders, its load-lock system and its unique fully automated high precision optical monitoring system LIDIZ can be configured for different needs to fully provide all advantages of IBS technology as high film purity, the most stable deposition rate at lowest optical losses.
For coating examples and detail information about LIDIZ please download the LIDIZ CATALOGUE.
| Installation area | 3540×1840×2000 mm (L×W×H) |
|---|---|
| Equipment weight | 4500 kg |
| Sputtering source | RF Grid IBS with RF neutralizer |
| Assistance source | RF Grid IBS with RF neutralizer |
| Substrate Holder | Single disk Ø320 mm (area 800 cm2) |
| and coating area | Planetary 4x Ø 210 mm (area 1380 cm2) |
| and planetary 3×Ø320 mm (area 2400 cm2) | |
| Load-lock | For Single disk substrate holder |
| Coating uniformity | ≤±0.25% for planetary 4x Ø 210 mm |
| ≤±0.5% for single disk Ø320 mm | |
| ≤±0.5% for planetary 3×Ø320 mm (area 2400 cm2) | |
| Process monitoring system | Automatic optical monitoring system OCP: |
| OCP Broadband, | |
| OCP Singlewave, | |
| OCP Duo (Broadband and Singlewave 2 in 1) | |
| Substrate materials | glass ceramics, chromatic and achromatic optical glass, quartz, potassium fluoride, sapphire, etc. |
| Number of targets, max. | 4 pcs |
| Sputtering targets | Ti, Ta, Nb, Zr, Hf, AI, Si, SiO2 etc. |
| Coating rate | Up to 5 Å /sec (material dependent ) |
| Substrate temperature in the process | <100 оС |
| (without heater) | |
| Substrate heating system temperature | <250 оС |
| Substrate heating uniformity | ± 2 оС |
| Ultimate pressure | 2E-5 Pa |
| Time to reach Ultimate pressure | 8 hours |
| Process start pressure | 8E-4 Pa |
| Time to reach process start pressure | 30 min (without load-lock) |
| 15 min (with load-lock) | |
| Pumping system | Dry mechanical pump & cryogenic pump |
| Turbo molecular pump (optional) |