ORTUS 1100
Substrate holder: Dome ø995 mm, Planetary 4x ø387 mm. Automatic Optical Monitoring. 2xE-gun, 2XResistance evap., RF Plasma Assist Source.
ORTUS 1100
For production companies in the need of higher production capacities.
Suitable for coatings on 3D shaped substrates.
For detailed information about our ORTUS PIAD coater portfolio and its coating capabilities please download the
ORTUS CATALOGUE.
1. Substrate holder
| Size | Loading cap. of 1"for reff. | Thickness U% for all loading area | Max single substrate size | |
|---|---|---|---|---|
| Dome type | ø995 mm | 576 | ±2% | 380 mm |
| Planetary | 4 x ø387 mm | 416 | ±1% | 387 mm |
2. technological devices
Electron Beam Evaporation (EBE)
- 3 different sizes EV M-6, EV M-8, EV M-10
- Customized crucibles, 1 ... 12 pockets
- Max. quantity : 2 pcs
Cleaning and Assistance sources
- Accelerator with anode Layer (Ion Current Density up to 4.2 mA/cm^2)
- Copra: RF Plasma Assist Source (Ion Current Density up to 2.5 mA/cm^2)
- Max. quantity : 1 pcs
Resistance evaporation source
- Max. quantity : 2 pcs together with 2 EBE
3. COATING PROCESS CONTROL
Rate and thickness control system (quartz control)
Optical process monitoring system OCP
- OCP Singlewave for monochromatic monitoring
4. ACCESSORIES
- Substrate heating system
- IR lamps
- Tubular heater
Exampes of substrate holders for semispherical substrates