ORTUS 900
Substrate holder: Dome ø620 mm, Planetary 3x ø250 mm. Automatic Optical Monitoring. 2xE-gun, Resistance evap., End hall assist, RF Plasma Assist Source.
ORTUS 900
Enlarged version of compact ORTUS 700 that is aimed to provide possibility to work with bigger substrates.
For detailed information about our ORTUS PIAD coater portfolio and its coating capabilities please download the ORTUS CATALOGUE.
1. Substrate holder
| Size | Loading cap. of 1"for reff. | Thickness U% for all loading area | Max single substrate size | |
|---|---|---|---|---|
| Dome type | ø800 mm | 356 | ±2% | 300 mm |
| Planetary | 4 x ø327 mm | 284 | ±1% | 327 mm |
2. technological devices
Electron Beam Evaporation (EBE)
- 3 different sizes EV M-6, EV M-8, EV M-10
- Customized crucibles, 1 ... 12 pockets
- Max. quantity : 2 pcs
Cleaning and Assistance sources
- End-Hall ion source with Ion Current Density up to 1 mA/cm^2
- Accelerator with anode Layer (Ion Current Density up to 4.2 mA/cm^2)
- Copra: RF Plasma Assist Source (Ion Current Density up to 2.5 mA/cm^2)
- Max. quantity : 1 pcs
Resistance evaporation source
- Max. quantity : 1 pcs together with 2 EBE
3. COATING PROCESS CONTROL
Rate and thickness control system (quartz control)
Optical process monitoring system OCP
- OCP Singlewave for monochromatic monitoring
4. ACCESSORIES
- Substrate heating system
- IR lamps
- Tubular heater